Combinatorial Library Preparation

Peter K. Schenck and Debra Kaiser

The NIST Pulsed Laser Deposition Facility has been modified to a dual beam - dual target configuration to allow for the simultaneous deposition of thin films from two targets.

The dual beam delivery system includes an adjustable beam diverter, variable attenuator, and independent focus control of both beams. These additions allow the deposition process to be adjusted to control the deposition rate from each target. Since the targets are physically separated in space, the composition of the film will vary with position.





The films produced are referred to as library films since they can have substantial variations of composition, and therefore properties, in a small area. Such library films are ideal for analysis by modern high throughput methods.

The library films vary not only in composition, but in thickness creating different patterns of thin film interference. These are measured by high throughput spectroscopic reflectometry to determine thickness and optical properties. Systems currently under study include BaxSr1-xTiO3 and Au doped NiO.




Composition variations are mapped by electron microprobe analysis in CSTL (NIST Chemical Science and Technology Laboratory) which verified the continuously variable composition of the film. The technique is broadly applicable to the production of combinatorial library films of other ceramic materials as well as metal and metal/ceramic composites.








Privacy Policy / Security Notice / Accessibility Statement
Disclaimer | FOIA

NIST is an agency of the
U.S. Commerce Department

Date created: 08 February 2001
Last updated: 24 January 2003


Technical inquiries:
Ceramics Division
NIST, 100 Bureau Drive, Stop 8520, Gaithersburg, MD 20899-8520.
Phone (301) 975-6119
Fax (301) 975-5334

Ceramics website comments:
Ceramics Webmaster

General NIST inquiries:
Public Inquiries Unit:
Phone (301) 975-NIST (6478)
TTY (301) 975-8295