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The NIST Pulsed Laser Deposition Facility has been modified to a dual beam - dual target configuration to allow for the simultaneous deposition of thin films from two targets.
The dual beam delivery system includes an adjustable beam diverter, variable attenuator, and independent focus control of both beams. These additions allow the deposition process to be adjusted to control the deposition rate from each target. Since the targets are physically separated in space, the composition of the film will vary with position.
The films produced are referred to as library films since they can have substantial variations of composition, and therefore properties, in a small area. Such library films are ideal for analysis by modern high throughput methods.

Composition variations are mapped by electron microprobe analysis in CSTL (NIST Chemical Science and Technology Laboratory) which verified the continuously variable composition of the film. The technique is broadly applicable to the production of combinatorial library films of other ceramic materials as well as metal and metal/ceramic composites.
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